One of the key semiconductor technologies beyond 3D FinFET transistors are Gate-All-Around transistors, which show promise to help extend the ability to drive processors and components to higher performance and lower power. Samsung has always announced that its first generation GAA technology will align with its ‘3nm’ nodes, with its 3GAE and 3GAP processes. As part of the Samsung Foundry Forum today, some more insight was put into the timeline for the rollout, as well as talk of its 2nm process.
TSMC last week held a groundbreaking ceremony for its Fab 18 phase 1 production facility. The fab will produce chips using TSMC’s 5 nm process starting from early 2020...27 by Anton Shilov on 1/31/2018
Keeping an eye on the ever-evolving world of silicon lithography, GlobalFoundries has recently disclosed additional details about its 7 nm generation of process technologies. As announced last September, the...76 by Anton Shilov on 6/23/2017
Samsung and TSMC have made several important announcements about the present and future of their semiconductor manufacturing technologies in March. Samsung revealed that it had shipped over 70 thousand...89 by Anton Shilov on 5/5/2017
GlobalFoundries has announced plans to expand manufacturing capacities for its leading edge and mainstream production technologies in the U.S., Germany and Singapore. After the upgrades of the fabs are...49 by Anton Shilov on 2/11/2017
GlobalFoundries recently announced the first details about its next generation 7 nm manufacturing technology, which is being developed in-house, and revealed plans to start production of chips using the...76 by Anton Shilov on 10/3/2016
As reported at The Motley Fool, Intel’s latest 10-K / annual report filing would seem to suggest that the ‘Tick-Tock’ strategy of introducing a new lithographic process note in...98 by Ian Cutress on 3/22/2016
At the recent annual SPIE Advanced Lithography conference, Intel, TSMC and other leading semiconductor companies said that significant strides have been made in extreme ultraviolet lithography (EUVL) over the...38 by Anton Shilov on 3/10/2016